| abstract |
The present invention relates to a resist composition for producing electronic components, particularly via electron beam lithography. In addition to the conventional base polymerization component (resist polymer), a secondary electron generator is included in the resist composition of the present invention to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of the resist in a controlled manner, which helps to efficiently produce high resolution patterned substrates (and thus electronic components), but with much faster writing speeds. |