http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201546877-A

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filingDate 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5851ed46a870b95d0344ed636ced2b5d
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publicationDate 2015-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201546877-A
titleOfInvention Film forming method, film forming device and recording medium
abstract The present invention is directed to a film forming method for forming a film containing a doping element in a vacuum atmosphere, comprising: an adsorption process for supplying a material gas from a material gas supply unit to a processing container in a vacuum atmosphere; The substrate is adsorbed to the raw material of the raw material gas; the doping procedure is repeated a plurality of times: "the doping gas containing the doping element is supplied from the doping gas supply portion into the processing container, and the doping gas is sealed in the processing container And a step of vacuuming the inside of the processing container; a reaction program for supplying a reaction gas that reacts with the raw material to generate a reaction product from the reaction gas supply unit; and a replacement program The process is performed to replace the atmosphere in the processing container, and the doping gas is supplied from the source gas supply unit, the doping gas supply unit, and the reaction gas supply unit to prevent the reverse flow gas from flowing into the processing container. .
priorityDate 2014-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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