| abstract |
The present invention relates to a photosensitive resin composition containing (A), (B), (C) and (D), and the content of (A) is 45 mass based on the total content of (A) and (C). % or more and 80% by mass or less.n(A) a structural unit containing a structural unit derived from an aromatic carboxylic acid having an ethylenically unsaturated bond, and an unsaturated compound derived from a cyclic ether structure having a carbon number of 2 to 4, and having no carbon number 4~ a polymer of a structural unit of a perfluoroalkyl group of 6; (B) a polymer having a structural unit having a perfluoroalkyl group having 4 to 6 carbon atoms; (C) a polymerizable compound; and (D) a polymerization initiator. |