| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_781c429e4e20536916ff74dcbe1b5417 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-80 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G3-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25B1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25B13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25B9-23 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G3-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B9-23 |
| filingDate |
2015-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d7a4208822824bfd4bef74e0240e986
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1aad98f3ce31bcee5f357a004d4afa27 |
| publicationDate |
2015-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201545990-A |
| titleOfInvention |
Copper chloride, CVD raw material, copper wiring film, and copper chloride manufacturing method |
| abstract |
The present invention provides a method for producing copper chloride, a CVD raw material, a copper wiring film, and copper chloride which can provide a high-purity organometallic complex having less impurities.nThe present invention is a copper chloride having a purity of 6 N or more and an Ag content of 0.5 wtppm or less. |
| priorityDate |
2014-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |