http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201543532-A

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filingDate 2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2015-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201543532-A
titleOfInvention Method and device for plasma processing of substrate
abstract The present invention relates to a device for exposing at least one substrate (7) to a plasma, the device having a first electrode (1) and a second electrode (12) opposite the first electrode The electrodes are formed together to produce the plasma between the electrodes (1, 12), characterized in that at least one of the electrodes (1, 12) is composed of at least two electrode units ( 2, 3) Formation.nFurthermore, the invention relates to a corresponding method.
priorityDate 2014-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.