| abstract |
The present invention relates to a polishing composition for use in polishing a polishing object having a layer containing a cobalt element, which comprises a cobalt dissolution inhibitor, a pH adjuster, and a pH of not less than 4 And not more than 12, the cobalt dissolution inhibitor is at least one selected from the group consisting of an organic compound having an ether bond, an organic compound having a hydroxyl group, an organic compound having a carboxyl group and having a molecular weight of not less than 130, and a group of the salts. . According to the present invention, there is provided a polishing composition capable of suppressing dissolution of a layer containing a cobalt element when polishing an object to be polished having a layer containing a cobalt element. |