http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201540735-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a1a60d29f12f88d3cc3afb94ac73c20a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 |
| filingDate | 2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3d87b20d03d707f11fa43d5e5e6f639 |
| publicationDate | 2015-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201540735-A |
| titleOfInvention | Method for preparing photosensitive polyurethane organic bismuth resin |
| abstract | The invention belongs to the technical field of polyurethane modification, and in particular relates to a preparation method of a photosensitive polyurethane organic bismuth resin. The preparation method of the invention has simple process steps and low cost, and is suitable for industrial production. The photosensitive polyurethane organic bismuth resin product prepared by the invention combines the advantages of the polyurethane resin and the organic bismuth resin and overcomes the defects of the single polyurethane resin and the organic bismuth resin, and has good wear resistance, water resistance, weather resistance and photosensitivity. The gel formed after photocuring has high hardness and good flexibility. |
| priorityDate | 2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 83.