http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201538804-A

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filingDate 2015-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c644096b7bfa2cda1ab60fda3456d59e
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publicationDate 2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201538804-A
titleOfInvention Method and apparatus for electroplating and seed layer detection
abstract The present invention discloses a method and apparatus for detecting a seed layer for electroplating. The methods and associated devices operate by: selecting a wafer for processing; measuring a color signal in one or more processes having one or more color components from its surface; calculating one or more metrics, each A metric represents a difference between one of the process color and a set of corresponding reference color signals; determining the crystal according to whether a predetermined number of the one or more metrics fall within a relevant preset range corresponding to the respective metrics Whether the circular surface is acceptable for the presence of a seed layer; and plating the wafer when an acceptable seed layer is present or designating the wafer to be unacceptable for plating. The above may be repeated for one or more additional wafers to plate a plurality of wafers of a set of wafers.
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priorityDate 2014-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.