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filingDate 2015-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52024e982b5c2e3d3d67fec686241f9f
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publicationDate 2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201538420-A
titleOfInvention Barium nitride powder for slurry, method for producing the same, barium nitride powder slurry for release profile, method for producing the same, barium nitride powder for release profile, release profile, and mold for casting polycrystalline crucible and method for producing the same
abstract The present invention provides a tantalum nitride powder slurry for a profiled material, a method for producing the same, a tantalum nitride powder for a release profile, a release profile, and a tantalum nitride for use in obtaining a slurry of the tantalum nitride powder for the release profile. Powder, a method for producing the same, and a mold for casting a polycrystalline tantalum having a good release property of a polycrystalline niobium ingot, and a low-cost production method thereof, wherein the above-mentioned tantalum nitride powder slurry for a release material does not require an additive such as a binder and does not need to be burned. In the step of casting, the mold for polycrystalline ruthenium casting can form a release layer which is excellent in release property of the polycrystalline ruthenium ingot and which is excellent in adhesion to the mold after casting of the polycrystalline ruthenium ingot.nThe present invention relates to a tantalum nitride powder for slurry, which is used for a tantalum nitride powder for a release layer forming slurry for a polycrystalline tantalum casting mold, and has a specific surface area of 5 to 50 m 2 /g, and is amorphous. The ratio of cerium nitride is 1.0 to 25.0% by mass, and the oxygen content is 0.6 to 2.5% by mass.
priorityDate 2014-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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