http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201535750-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c87b3d7ac100dbdc7843d82cb5ae2491
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1054
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-24
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
filingDate 2014-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e0f56c4e42a37bcc0db7fbb4e9ef805
publicationDate 2015-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201535750-A
titleOfInvention Thin film transistor and method of manufacturing same
abstract The present invention relates to a thin film transistor and a method of manufacturing the same. The thin film transistor comprises a substrate, a dual channel semiconductor layer, a semiconductor protection layer, a gate, a gate dielectric layer, a source, and a drain. The dual channel semiconductor layer includes a first semiconductor layer and a second semiconductor layer. The first semiconductor layer is made of a metal oxide semiconductor material and formed over the substrate. The second semiconductor layer is made of the metal oxide semiconductor material doped with an oxygen absorbing metal and formed on the first semiconductor layer. A semiconductor protective layer is formed on the second semiconductor layer. The gate is formed and located above the substrate. A gate dielectric layer is formed between the gate and the dual channel semiconductor layer. The source and the drain are adjacent to the two-channel semiconductor layer, formed over the substrate, and electrically connected to the two-channel semiconductor layer.
priorityDate 2014-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419574908
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14945
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23925
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415818014
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID159452
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558805
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447573583
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559477
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577487
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559470
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559310
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21225548
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577474
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID117625
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447611988
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419525060
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414876162
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359967
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14806
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451780876
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID29011
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID518558
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450479996
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23994
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14915
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID26042
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450068310
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419549163
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523934
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14801
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23986
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454387746
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23963
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID49868117
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559192
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359367
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578761
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14805
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123105
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57350325
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID158605
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707770
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5354495
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458437694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID162028862
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5360835
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530175
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457706951
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11651651
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559288
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447604988
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID150905
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491185
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449325759
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23930

Total number of triples: 84.