| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2015-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd220c8e594f4d931fdf5226b401ff4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24fc1b958be16a1abc66d8bdf424bf85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2623bf7cd466ba2673bd806aa4836f85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0942c5e039857f4e12377211c6861570 |
| publicationDate |
2015-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201533539-A |
| titleOfInvention |
Pattern forming method, etching method, manufacturing method of electronic component, and electronic component |
| abstract |
A pattern forming method comprising: (i-1) a step of forming a first film using a sensitizing ray-sensitive or radiation-sensitive resin composition (1) on a substrate, and (i-2) performing a first film on the first film a step of exposing, (i-3) developing the exposed first film using a developing solution containing an organic solvent to form a first negative pattern; (iii) using at least a first negative pattern, using photosensitive a step of forming a second film by a ray- or radiation-sensitive resin composition (2); (v) a step of exposing the second film; and (vi) using a developing solution containing an organic solvent for the second exposure The film is developed to form a second negative pattern on at least the first negative pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11705351-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11694914-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11049741-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I705252-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11476134-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11244841-B2 |
| priorityDate |
2014-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |