http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201531583-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a3bb4ae410da4be8184239adc5ab1c0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4554 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2014-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3762cae68b4af4cc0d27ee99aa40c9d5 |
| publicationDate | 2015-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201531583-A |
| titleOfInvention | Method for forming a compliant oxidized, nitrided, or carbonized dielectric film by atomic layer deposition |
| abstract | A method of forming a film by atomic layer deposition (ALD) treatment on a patterned surface of a substrate, comprising the steps of: adsorbing a first precursor onto a patterned surface, the first precursor being in its molecule Containing ruthenium or a metal; adsorbing a second precursor onto a surface adsorbing the first precursor, the second precursor containing no ruthenium or metal in its molecule; exposing the surface adsorbing the second precursor to an excited reaction The precursors that are adsorbed on the surface of the substrate by oxidation, nitridation, or carbonization; and repeating the above cycle to form a film on the patterned surface of the substrate. |
| priorityDate | 2013-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.