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filingDate 2014-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f4e20ee48f817a28c13892e76fad311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81f42f2f32861a683f5de23e36d3164c
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publicationDate 2015-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201526186-A
titleOfInvention Integrated circuit including copper pillar structure and manufacturing method thereof
abstract The invention discloses an integrated circuit comprising a copper pillar structure and a manufacturing method thereof. In an exemplary embodiment, the integrated circuit includes a final metal layer and a passivation layer disposed over the last metal layer. The final metal layer and the passivation layer are disposed on the active circuit active device formed on the semiconductor substrate. . The integrated circuit further includes a copper pillar structure partially disposed within the first portion of the passivation layer and directly over the last metal layer. The first portion of the passivation layer is defined by the first and second sidewalls of the passivation layer and the upper surface of the final metal layer. The copper pillar structure includes a liner formed over the first and second sidewalls and the upper surface of the last metal layer and a copper material within the liner. The copper post structure including the liner and the copper material in the liner further extends to a height above the upper surface of the passivation layer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11031382-B2
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priorityDate 2013-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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