http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201525467-A

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filingDate 2014-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db03501a6b9f568bda927ba73f0f7554
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publicationDate 2015-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201525467-A
titleOfInvention Probe device
abstract When the electrical characteristics of the semiconductor element are inspected at the wafer level, it is possible to easily and efficiently prevent the occurrence of light (discharge) in the vicinity of the wafer surface.nIn the probe device, the spark preventing mechanism (50) has a surrounding member (52) surrounding the probe (26S, 26G) between the probe card (16) and the mounting table (12); And the gas supply means (54), when the electrical characteristics of each of the wafers (power elements) are inspected on the semiconductor wafer (W), a predetermined pressure higher than atmospheric pressure is formed around the probes (26S, 26G). In an environmental manner, gas is supplied to the periphery of the probes (26S, 26G) via the inside or the vicinity of the surrounding member (52). The contact plate (34) also serves as a surrounding member (52).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I759588-B
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Total number of triples: 22.