| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-00 |
| filingDate |
2013-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f47657288576cd97fe9241f67013cb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ac065c818068652a814fdab2f43753b |
| publicationDate |
2015-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201523154-A |
| titleOfInvention |
Positive photosensitive resin composition, pattern forming method, thin film transistor array substrate, and liquid crystal display element |
| abstract |
A positive photosensitive resin composition, a pattern forming method, a thin film transistor array substrate, and a liquid crystal display element are provided. A positive photosensitive resin composition comprising: a novolak resin (A), an alkali-soluble resin (B), an ester of an o-naphthoquinonediazidesulfonic acid (C), and a solvent (D). The above alkali-soluble resin (B) comprises a first alkali-soluble resin (B-1) which is obtained by a polymerization reaction of a mixture; and the above mixture contains the epoxy compound (i) and the compound (ii). The above epoxy compound (i) has at least two epoxy groups, and the above compound (ii) has at least one carboxylic acid group and at least one ethylenically unsaturated group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I749104-B |
| priorityDate |
2013-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |