| abstract |
The present invention provides a sensitized ray-sensitive or radiation-sensitive resin composition which can form a pattern having an excellent pattern profile for use in positive-type development, and a pattern forming method and an electronic device. Manufacturing methods, electronic devices, and compounds. The sensitizing ray-sensitive or radiation-sensitive resin composition of the present invention is a sensitizing ray-sensitive or radiation-sensitive resin composition used for forming a sensitizing ray-sensitive or radiation-based resin composition film on a substrate, and contains at least: At least one compound (A) selected from the group consisting of the following (A1) and (A2), and a resin (P) having a change in solubility in a developing solution due to decomposition of an acid; (A1) has a substrate-bonding group, a compound that generates an acid by irradiation with actinic rays or radiation; and (A2) a compound having a substrate-bonding group and an acid group. |