| abstract |
A photoacid generator compound having the formula (1):n□nWherein n is 0 or 1; and R1 to R6 are each independently hydrogen, halogen, or unsubstituted or substituted C1-20 straight or branched alkyl, C3-20 cycloalkyl, C6- 20 aryl, C3-20 heteroaryl, or an acid generating group having the following structure:n□nWherein L is an unsubstituted or substituted C1-50 divalent group; a Z-based monovalent anionic group; and, an M+ system ruthenium or osmium cation.偕R group can be associated with itnThe carbons combined are combined to form a ring as long as no more than two such rings are formed. At least one of R1 to R6 includes the acid generating group, or two 偕R groups are combined to form the acid generating group. Also disclosed is a photoresist composition incorporating the photoacid generator compound, a coated substrate comprising the layer of the photoresist composition, and a method of forming an electronic device using the photoresist composition layer. |