http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201522690-A

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publicationDate 2015-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201522690-A
titleOfInvention Method of using sputtering target and method of manufacturing oxide film
abstract One aspect of the present invention provides a method of using a sputtering target capable of forming an oxide film containing a plurality of metal elements and having a high degree of crystallinity. In a method for using a sputtering target including a polycrystalline oxide having a plurality of crystal grains, the plurality of crystal grains have a cleavage surface, and the sputtering particles are caused by impinging ions against the sputtering target Each of the split faces is stripped; and the sputtered particles are uniformly deposited onto the deposition surface while being mutually repelled by positively charging the sputtered particles.
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