| abstract |
An object of the present invention is to provide an abrasive material particle which has polishing performance suitable for precision polishing, has a high polishing rate, and has high monodispersity, a polishing material containing the abrasive material particle, and a polishing processing method using the same.nThe abrasive material particles of the present invention are characterized in that the spherical shape particles having an average aspect ratio in the range of 1.00 to 1.15 are in a range of 50 to 1500 nm from the particle diameter D50 (nm) obtained by the particle diameter cumulative distribution curve. The average content of cerium, or the total content of cerium and at least one element selected from lanthanum (La), yttrium (Pr), yttrium (Nd), yttrium (Sm), and yttrium (Eu), relative to composition The total content of the total rare earth elements of the abrasive particles is 81 mol% or more. |