| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate |
2014-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c2268ab6d52a86dc03af3f369668589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f04400920727cf56f01b5702ae1a91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4856861c3aa0e9c958f966e2283bfc54 |
| publicationDate |
2015-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201514628-A |
| titleOfInvention |
Method for manufacturing photoresist composition |
| abstract |
An object of the present invention is to provide a method for producing a photoresist composition capable of producing a photoresist composition having reduced coating defects. A method for producing a photoresist composition, which comprises producing a photoresist composition for use in a semiconductor device manufacturing step, wherein the device for manufacturing the photoresist composition is washed with a washing liquid, and the washing liquid is taken out from the manufacturing device and spin coated. In the evaluation of the substrate, the cleaning is performed until the defect having a size of 100 nm or more on the evaluation substrate has a change in the defect density before and after the application of 0.2/cm 2 or less, and then the photoresist composition is produced by the above-described manufacturing apparatus. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11392046-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I567113-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I770099-B |
| priorityDate |
2013-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |