http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201514613-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-09 |
| filingDate | 2014-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2e430c6f749b0a3f460f1d544adc332 |
| publicationDate | 2015-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201514613-A |
| titleOfInvention | Mask substrate substrate, mask substrate, transfer mask, and the like, and method of manufacturing the same |
| abstract | Provided is a substrate for a mask substrate, a mask substrate, and a transfer mask which are capable of suppressing a decrease in the manufacturing yield of the substrate for a mask substrate and having a flatness of the main surface having an extremely high effect. Also, a manufacturing method of the above is proposed.nThe setting is made by the term that only the number of powers of the radius-related coefficient is two or less, and the number of powers of the radius-related coefficient is defined by the Zernike polynomial including one or more second-order terms. The data (PV value) which is the difference between the maximum value and the minimum value of the difference between the reference surface and the measured shape of the substrate for the mask base is 1/8 or less than the exposure wavelength λ. The substrate for the mask base. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10552569-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I797383-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I665510-B |
| priorityDate | 2013-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.