| abstract |
The present invention provides a compound and a sensitizing ray-sensitive or radiation-sensitive resin composition comprising (A) a sensitizing ray or a radiation sensitive to a compound represented by the following formula (I) or formula (II) The resin composition can form a very fine pattern (for example, a line width of 50 nm or less) in a state in which both high sensitivity and high resolution (for example, high resolution), excellent pattern shape, and small line edge roughness are satisfied. .n□ □ Y1 and Y2 represent a monovalent organic group. M1+ and M2+ represent organic cesium ions. X1 and X2 represent a group represented by -S-, -NH- or -NR1-. R1 represents a monovalent organic group. N1 and n2 represent an integer of 1 or more. R1 and Y1 or Y2 may be bonded to each other to form a ring. |