http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201511235-A

Outgoing Links

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filingDate 2014-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa07e0c99c24a951a9ae29a1ca0eb12f
publicationDate 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201511235-A
titleOfInvention Semiconductor device
abstract An object of the present invention is to provide a semiconductor device excellent in charge retention characteristics. As a transistor for connecting the gate to the node for holding electric charge, a transistor including a thick gate insulating film to reduce leakage current is separately provided. The charge corresponding to the material is held in the node by using the separately provided transistor and a transistor in which the oxide semiconductor is used for the semiconductor layer including the semiconductor layer of the channel formation region.
priorityDate 2013-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 24.