| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2014-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2623bf7cd466ba2673bd806aa4836f85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c607cdb583055fac7d5dbe1b287fa1a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0ba7b215ff6ec205b4a61d9c5a69209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc |
| publicationDate |
2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201510662-A |
| titleOfInvention |
Pattern forming method, surface treating agent and use thereof, and manufacturing method and electronic component of electronic component |
| abstract |
The present invention provides a pattern forming method capable of forming a pattern having a flatness at the top of a pattern or a pattern having excellent pattern remnancy during double development, a surface treating agent therefor, a method of manufacturing an electronic device, and an electronic component, the pattern forming method The steps include: (1) a step of forming a photosensitive ray-sensitive or radiation-sensitive film composition by a photosensitive ray-sensitive or radiation-sensitive resin composition containing an acid a resin which decomposes and generates a polar group; (2) a step of exposing the photosensitive ray-sensitive or radiation-sensitive film; (4A) containing an interaction with a polar group possessed by the exposed resin a step of applying a surface treatment agent of the compound to the photosensitive ray-sensitive or radiation-sensitive film; and (5A) a step of developing the photosensitive ray-sensitive or radiation-sensitive film using a developing solution containing an organic solvent. |
| priorityDate |
2013-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |