| abstract |
The present invention provides a negative photosensitive resin composition, an electronic device, and a polymer which are excellent in balance between resolution and time required for pattern formation.nThe present invention provides a negative photosensitive resin composition comprising the following polymer and a photoradical polymerization initiator containing the repeating unit represented by the following (1) and (2a), and the formula (2a) R5 is an organic group having a radical polymerizable group and having a carbon number of 2 to 18.n□ (In the formula (1), R1, R2, R3 and R4 are each independently hydrogen or an organic group having 1 to 30 carbon atoms. n is 0, 1 or 2) |