http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201510646-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0ac96f61e2222852f331ec0ed094e4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae8a14a379593f8cf8ea878c98642203 |
| publicationDate | 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201510646-A |
| titleOfInvention | Pattern forming method, and manufacturing method and electronic device of electronic device using same |
| abstract | A pattern forming method comprising, in order, using a photosensitive linear or radiation-sensitive resin containing (A) a resin having a repeating unit represented by the general formula (I) and a compound represented by the general formula (II) The composition, the step (1) of forming a film, the step (2) of exposing the film using electron rays or extreme ultraviolet rays, and the step (3) of developing after exposure using a developing solution containing an organic solvent. By this method, it is possible to provide a pattern forming method capable of satisfying excellent pattern collapse performance, excellent roughness performance, and excellent development defect performance in a very fine (for example, line width of 50 nm or less) pattern formation, and A method of manufacturing an electronic device using the same and an electronic device.n□ In the formula (I), R01, R02 and R03 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group; and R03 may be bonded to Ar1 to form a 5-member or a 6-member. Ring, in which case R03 represents an alkylene group; Ar1 represents an (n+1)-valent aromatic ring group, and when bonded to R03 to form a ring,n(n+2) valent aromatic ring group; n Y each independently represents a hydrogen atom or an acid labile group; however, at least one of Y represents an acid labile group; n represents an integer of 1 to 4;n□ In the formula (II), X+ represents a relative cation; Xf1 represents a fluorine atom or an alkyl group substituted with at least one fluorine atom, and the Xf1 groups in the plural may be the same or different; and R11 and R12 each independently represent a hydrogen atom. , a fluorine atom or an alkyl group, each of R11 and R12 in the plural may be the same or different; L1 represents a divalent linking group, and the L1 system in the plural may be the same or different; Cy1 represents the following formula (ST) a group of the alicyclic structure shown; a carbon atom of a ring member in the alicyclic structure represented by the following formula (ST), which may be a carbonyl carbon atom;n□x1 represents an integer from 1 to 20; y1 represents an integer from 0 to 10; and z1 represents an integer from 0 to 10. |
| priorityDate | 2013-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 428.