| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2014-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c7df139bb8b8a4400ab8cda5a63fb4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07ea293e839a9b383f4cec85d6582d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb61b9779224e610d893341260a717b1 |
| publicationDate |
2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201510199-A |
| titleOfInvention |
Honing composition |
| abstract |
An object of the present invention is to provide a polishing composition which can reduce organic residues and improve the production yield of a semiconductor device.nThe present invention provides a polishing composition for polishing a polishing object to be polished, comprising at least one of a metal corrosion inhibitor and a surfactant; an oxidizing agent; and an organic compound; and the organic compound has 2 ~3 hydroxyl groups. |
| priorityDate |
2013-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |