http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201509902-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-285 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 |
| filingDate | 2014-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7144f535e35f4ed7a1983f7f191e32cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f694c27044096569595b635400d3b70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_204204ac944eeab1a4a1267e1ffdc23d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f15abea88572576cc528bffedcfcddc |
| publicationDate | 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201509902-A |
| titleOfInvention | Novel alicyclic ester compound, (meth)acrylic acid copolymer and photosensitive resin composition containing the same |
| abstract | An object of the present invention is to provide a chemically amplified resist which improves sensitivity or resolution and line edge roughness without impairing the basic physical properties of a resist such as a pattern shape, dry etching resistance, and heat resistance. LER) is a well-balanced resist and compound.nThe solution is a mixture of the alicyclic ester compounds represented by the general formulae (1) to (3), a method for producing the same, and a (meth)acrylic acid copolymer of the alicyclic ester compound of the general formulae (1) to (3). And its photosensitive resin composition.n□□□ (wherein R1 represents a hydrogen atom or a methyl group, and R2 and R3 may be the same or different, and each independently represents a hydrogen atom, a hydroxyl group, a cyclic or linear, branched alkyl having 1 to 10 carbon atoms; a group, an aryl group, a cycloalkyl group, an alkoxy group having 1 to 10 carbon atoms, an aryloxy group, a decyloxy group having 2 to 6 carbon atoms, or a halogen group). |
| priorityDate | 2013-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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