http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201507232-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5df5525854dee227f901af488c86abe8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-844 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 |
| filingDate | 2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_992a10071dcd9b86c73fcc876f1ff7a1 |
| publicationDate | 2015-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201507232-A |
| titleOfInvention | Film formation of environmentally sensitive devices |
| abstract | Embodiments relate to forming a barrier layer on a device, and thereafter performing the use of ozone to form a radical-assisted atomic layer deposition that acts as an oxygen radical for a reactant precursor deposited on a blanket deposition layer over the device. (RA-ALD). Before the substrate is exposed to ozone or oxygen radicals generated from ozone or oxygen radicals and hydroxyl radicals (generated from ozone mixed with a hydrogen-containing gas such as hydrogen or ammonia), by forming the substrate on the substrate The device is exposed to free radicals of a nitrogen compound gas to form the barrier layer on the substrate to prevent ozone, its free radicals or a combination of oxygen radicals and hydroxyl radicals from penetrating and damaging during the process of depositing the blanket deposition layer The device. |
| priorityDate | 2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.