| abstract |
Provided is a method for producing an organic transistor element having a microfabricated insulating film which can be formed by a wet coating method on a fluororesin film having high liquid repellency by a photosensitive resin The insulating film is formed, and the adhesion between the insulating film formed by the photolithography step and the insulating film formed of the fluororesin is relatively high.nA coating liquid of a photosensitive resin is applied onto the laminate to form a photosensitive resin film, and the photosensitive resin film is partially exposed and developed to form a second insulating film to obtain an organic transistor element. The laminate has a substrate and a gate. a pole electrode, a gate insulating film, a source electrode, a drain electrode, an organic semiconductor layer, and a first insulating film. The first insulating film is made of a fluororesin (F) and has a water contact angle of 105° or more on the surface. The photosensitive resin contains a fluororesin (A) having a crosslinkable group and a radical polymerization initiator (C), and the fluorine atom content in the solid content is 10 to 45% by mass. |