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publicationDate 2015-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201506978-A
titleOfInvention Protective coating layer of plasma processing chamber parts and using method thereof
abstract An RF return-back strap coated with a flexible polymer or elastomer is used in the plasma chamber to protect the RF strap from free radicals (such as fluorine or oxygen radicals) generated by the plasma. And providing a semiconductor substrate processing method for reducing particulate contamination in a plasma processing apparatus. This coated RF strap minimizes the generation of particulates and exhibits a lower erosion rate than uncoated components. Such a coating member having a flexible coating on the electrically conductive flexible substrate member is provided with an RF ground return and is configured to allow one or more electrodes to move within the adjustable gap capacitive coupling plasma processing chamber.
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