http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201503281-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fbdc51c2665335e616caf341cdaa3d28 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
filingDate | 2014-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aca2247ecfb8e4092263a692934cbc37 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_621f562fc2955562d62280516be9bc41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14f47eeb8d29a14937618acfdc148cb3 |
publicationDate | 2015-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201503281-A |
titleOfInvention | Plasma processing device and its electrostatic chuck |
abstract | The present invention discloses an electrostatic chuck comprising an insulating layer embedded with an electrode for carrying a semiconductor wafer, the insulating layer having a main body portion and an annular flange extending outward along a sidewall of the main body portion; a base located at the insulation a layer below the bonding layer between the insulating layer and the base for bonding the insulating layer and the base, wherein the annular flange extends beyond an outer circumference of the bonding layer; and an edge ring Located above the annular flange, the inner wall of the edge ring has a gap with the outer periphery of the body portion and partially overlaps the annular flange. The invention can effectively prevent the damage of the electrostatic chuck caused by plasma bombardment. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I785805-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I741551-B |
priorityDate | 2013-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527018 |
Total number of triples: 16.