| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B2210-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-213 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0641
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-211 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F17-50 |
| filingDate |
2014-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_329111f54daee655939cba86fca214ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_233bbe7d0fbdcfdddf5c5bd3e2802c4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c5780c688bb5bc6c76f86ec411d6273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccd7d4ecd99526f1519c21d25b2d2e2e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5980aad8abf9076f9386058d8e68e0e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83834ebe1a095f7765dd0133fa8956c1 |
| publicationDate |
2015-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201502829-A |
| titleOfInvention |
Metering system for parameter tracking optimization |
| abstract |
Methods and systems for assessing the ability of a metrology system to track measurement parameters through a custom window are presented herein. Performance assessments include random disturbances, system disturbances, or both to effectively characterize model errors, metering system defects, and calibration errors and other effects. In some examples, the metrology target parameters are predetermined as part of the experimental design (DOE). The estimated values of the measurement target parameters and the known DOE parameter values are compared to determine the tracking ability of the particular measurement. In some examples, the measurement model is parameterized by the principal component to reduce the amount of freedom of the measurement model. In addition, an exemplary method and system for optimizing the measurement capabilities of a semiconductor metering system for metrology applications undergoing process variations is presented. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11756187-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I706127-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I709902-B |
| priorityDate |
2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |