| abstract |
The present invention provides a pattern forming method and composition set which are excellent in suppressing generation of defects such as lossless sensitivity, resolution, LWR, and pattern shape in the formation of a fine pattern having a line width of 50 nm or less. A resist film using the same, a method of manufacturing an electronic component, and an electronic component. The pattern forming method includes: (i) a step of forming a film on a substrate using a photosensitive ray-sensitive or radiation-sensitive resin composition containing (A) acid-containing a resin which decomposes and acts on a change in solubility of a developing solution, and (C) has a group selected from a fluorine atom, a fluorine atom-containing group, a halogen atom-containing group, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, a resin having one or more groups in a group consisting of at least one alkyl-substituted aromatic ring group and at least one cycloalkyl-substituted aromatic ring group; (ii) using a resin (T)-containing resin a top coating composition for forming a top coat layer on the film;n(iii) a step of exposing the film having the top coat using actinic rays or radiation; and (iv) developing the film having the top coat after the exposing The steps of the pattern. |