Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9255994893bc559e4608e627388ba146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6a162b65402a9a79580e3ae31dcbf3fa |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0341 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K1-0016 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K1-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K35-262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K1-0008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K1-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-09 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K31-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-34 |
filingDate |
2014-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3a51fbed3a7e6c8ac54ceeb48dfce5a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a2c689172b584bfc3922ac0985153c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_449866a745d3210123e0ae549e33cc70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f14fc7c9e650a899f280c28518ea3647 |
publicationDate |
2014-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201448699-A |
titleOfInvention |
Wiring substrate and method of manufacturing same |
abstract |
The present invention provides a wiring substrate comprising: an electrode including Cu or a Cu alloy; a plating film having a film containing at least Pd formed on the electrode; no Pd concentration layer between the electrodes and heat bonding on the plating film The Pd dissolved solder having a melting point of less than 140 ° C. |
priorityDate |
2013-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |