http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201448036-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02348 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2014-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1b891488a5489a2d8d2e20156b6f251 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcd79d955774624a15dd5459e5de68aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf9e3079c7276af8e307a8a7299aa0d9 |
| publicationDate | 2014-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201448036-A |
| titleOfInvention | UV hardening process for improving the mechanical strength and throughput of low-k dielectric films |
| abstract | Disclosed herein are low dielectric constant porous dielectric films having improved mechanical strength and methods of making the low dielectric constant porous dielectric films. A method of forming a dielectric layer can include: positioning a substrate in a processing chamber; transferring a deposition gas to the processing chamber; depositing a dense organic germanium layer on the surface of the substrate by using a deposition gas, the dense organic germanium layer including the hole Carbon; forming a pore-forming plasma from the reaction gas; exposing the dense organic layer to the pore-forming plasma to produce a porous organic layer, wherein the pore-forming plasma removes at least a portion of the pore-forming carbon; and exposing the porous organic layer Ultraviolet (UV) radiation. |
| priorityDate | 2013-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 66.