| abstract |
The present invention relates to a complex having at least one metal atom, a cross-linking ligand, and at least one compound selected from the group consisting of a hydroxy acid ester, a β-diketone, a β-ketoester, and a β-dicarboxylate. (b) The cross-linking ligand contains a cross-linking ligand (a) derived from the compound of the formula (1), and contains the cross-linking ligand (a) for the entire cross-linked ligand. The composition is formed of an inorganic film for a multilayer photoresist process of 50 mol% or more. In the formula (1), R1 is an n-valent organic group. X is -OH, -COOH, -NCO or -NHR2. n is an integer from 2 to 4. □ |