http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201445244-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 |
filingDate | 2010-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbad61c73daaf09b451d6638d83b9df8 |
publicationDate | 2014-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201445244-A |
titleOfInvention | Reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device |
abstract | An object of the present invention is to provide a reflective mask substrate which can improve the contrast of EUV exposure light when used in a reticle, and can improve the pattern resolution of the edge portion of the pattern to perform high-resolution pattern transfer. Reflective reticle. The reflective reticle substrate 10 of the present invention comprises a substrate 1, a multilayer reflective film 2 for sequentially reflecting EUV exposure light formed on the substrate, and an absorber film 4 for absorbing EUV exposure light, and the absorber film 4 comprises Ta The material is formed with a film density of 6.0 to 16.0 g/cm3. The reflective reticle 20 is obtained by forming a transfer pattern on the absorber film of the reflective reticle base. |
priorityDate | 2009-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.