| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L85-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-00 |
| filingDate |
2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f04400920727cf56f01b5702ae1a91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c35dc31e0f008513854fb397a72146b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90276c3fc7ed227be052968bb970bcd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c7c43a1ce167de3105aa32bb80076a9 |
| publicationDate |
2014-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201443160-A |
| titleOfInvention |
Titanium-containing photoresist underlayer film forming composition and pattern forming method |
| abstract |
The present invention provides a titanium-containing photoresist underlayer film forming composition for forming a titanium-containing photoresist underlayer film which is excellent in pattern adhesion and excellent in etching selectivity. A titanium-containing photoresist underlayer film forming composition comprising (A) component, (B) component, and (D) component as a solvent; (A) component is selected from the following general formula (A-1), ( a titanium compound represented by A-2), one or more kinds of titanium-containing compounds obtained by hydrolyzing or condensing or hydrolyzing the titanium compound; Ti(OR1A)4(A-1) Ti(OR1A)4-na (OR2AO)na (A-2) The component (B) is selected from the titanium compounds represented by the following general formulae (B-1) and (B-2), and the titanium compound is hydrolyzed or condensed or hydrolyzed and condensed. One or more of the titanium-containing compounds include Ti(OR1B)4(B-1)Ti(OR1B)4-nb(OR2BO)nb(B-2). |
| priorityDate |
2013-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |