| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f84c8b47fa87bc60c02053eba839a220 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2303-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-328
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2305-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-3227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-008 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-722
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-06 |
| filingDate |
2012-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_202726795a7d41cf195298142eb3250b |
| publicationDate |
2014-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201441609-A |
| titleOfInvention |
Method and system for providing ultrapure water |
| abstract |
The present invention relates to a method and system for providing ultrapure water to a semiconductor manufacturing facility. Water is treated by using a free radical purification system and a free radical removal system. The free radical purification system can carry out actinic radiation by means of a free radical precursor compound, such as ammonium persulfate. The free radical removal system can include the use of a reducing agent. Ultrapure water can be further processed by using an ion exchange medium and a degassing device. A control system can be utilized to adjust the amount of precursor compound added, the intensity of actinic radiation, and the amount of reducing agent added to the water. |
| priorityDate |
2011-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |