http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201439680-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-30 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-20 |
| filingDate | 2014-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_134bd9f98bfb5deee9c3e1acccdfc39d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 |
| publicationDate | 2014-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201439680-A |
| titleOfInvention | Pattern forming method, sensible electron beam or sensible ultraviolet resin composition, resist film using the same, method of manufacturing electronic component, and electronic component |
| abstract | The present invention provides a pattern forming method which, when forming a pattern having a line width or a space width of an ultrafine (for example, several tens of nm order) while satisfying a good pattern shape and high outgassing performance, the pattern forming method includes a step of forming a film using an electron-sensitive wire or a photosensitive ultraviolet-ray resin composition containing a resin (Aa) and a resin (Ab), the resin (Aa) having a fluorine atom and a fluorine atom. a group, a group containing a halogen atom, an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 6 or more carbon atoms, an aryl group having 9 or more carbon atoms, an aralkyl group having 10 or more carbon atoms, and at least 1 One or more groups in the group consisting of an alkyl-substituted aryl group having 3 or more carbon atoms and an aryl group substituted with at least one cycloalkyl group having 5 or more carbon atoms, and the above resin (Ab) a change in polarity due to the action of an acid; a step (2) of exposing the film by an electron beam or an extreme ultraviolet ray; and a step of developing a pattern having a negative pattern by using a developing solution containing an organic solvent after exposure (3) ); and relative to the above sensed electron line or extreme ultraviolet The solid fat content of the composition, the resin (Aa) contained was 31 mass% to 90 mass%. Moreover, the present invention provides an electro-acceptance wire or a violent ultraviolet resin composition used in the pattern forming method, a resist film using the pattern forming method, a method of manufacturing an electronic component, and an electronic component. |
| priorityDate | 2013-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 569.