http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201438077-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_373cff03eec945ef6bf4b72bfe39565c |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
filingDate | 2010-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f35cc53d7bcb2e5c8d65277299242b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58337d60886972527672d4ddc7421e34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4465486207e962dcd866bb65e3f6f4cf |
publicationDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201438077-A |
titleOfInvention | Uncompressed integrated wafer fabrication equipment to clean wafers |
abstract | SUMMARY OF THE INVENTION The present invention discloses a cleaning wafer or substrate for use in cleaning or assembling components of an integrated wafer fabrication apparatus. The cleaning substrate can include a substrate having a variety of different predetermined surface feature configurations, such as one or more predetermined adhesives, non-sticks, static electricity, or protrusions, recesses, or other physical segments. The predetermined feature configuration allows for more efficient cleaning of the components for which it is used, such as where the integrated wafer wafer is located in an integrated wafer fabrication apparatus. The cleaning substrate can be forced into a clean or other location by vacuum, mechanical, electrostatic or other forces. Cleaning the substrate allows for a variety of different functions, including grinding or polishing. The cleaning substrate can be made by a novel fabrication process and it can then be used in conjunction with a wafer fabrication apparatus in a novel method of use. |
priorityDate | 2010-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 199.