http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201438058-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2014-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 |
publicationDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201438058-A |
titleOfInvention | Pattern forming method, manufacturing method of electronic component using the same, and electronic component |
abstract | The present invention provides a pattern forming method, whereby an excellent resolution is obtained when forming an isolated space pattern having an ultrafine spatial width (for example, a spatial width of 30 nm or less), and the pattern forming method includes: by sensitizing rayiness or feeling a step of forming a resist film by a radioactive resin composition, and the sensitizing ray-sensitive or sensitized radioactive resin composition contains a resin which is increased in polarity due to an action of an acid and which has reduced solubility in a developing solution containing an organic solvent, and a compound which decomposes and generates an acid by irradiation with actinic rays or radiation; a step of forming a protective film on the resist film by a protective film composition; and a resist film having a protective film by electron beam or extreme ultraviolet rays a step of performing exposure; a step of developing using a developer containing an organic solvent. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I677760-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11281103-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I706225-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I712863-B |
priorityDate | 2013-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 578.