http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201436068-A

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filingDate 2014-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc5b578d743810adf3ab40cd255f96e4
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publicationDate 2014-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201436068-A
titleOfInvention Microelectromechanical device and method of forming same
abstract One method embodiment of the present invention includes providing a MEMS wafer including a polysilicon layer having a first portion and a second portion. A carrier wafer is bonded to the first surface of the MEMS wafer, and bonding the carrier wafer produces a first cavity. The first surface of the first portion of the polysilicon layer is in contact with ambient pressure. A cap wafer is bonded to the second surface of the MEMS wafer, and the cap wafer is bonded to the first surface of the MEMS wafer to produce a second cavity including a second portion of the polysilicon layer and a The third cavity. The second surface of the first portion of the polysilicon layer is in contact with the pressure level of the third cavity. The first cavity or the third cavity is in contact with the surrounding environment.
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priorityDate 2013-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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