abstract |
A sputtering target comprising a homologous structural compound containing an oxide represented by InAlO 3 (ZnO) m (m 0.1 to 10), a bixbyite structural compound represented by In 2 O 3 , and a spinel represented by Zn 2 SnO 4 A structural compound containing an indium element (In), a tin element (Sn), a zinc element (Zn), and an aluminum element (Al). |