| abstract |
A monomer, hard reticle composition, and method of forming a pattern for a hard reticle composition are disclosed. Specifically, the present invention discloses a monomer for a hard mask composition represented by the following Chemical Formula 1, a hard mask composition comprising the monomer, and a method of forming a pattern using the hard mask composition. In Chemical Formula 1, A1 to A4, X1 to X3, M and n are the same as those described in the detailed description, □ |