| abstract |
The present invention relates to a sputtering target comprising a sintered body containing an oxide of indium, zinc and metal M, and containing In2O3, MIn2O4 and In2O3(ZnO)m in a crystalline phase (1≦m≦) 20), the relative density is 95% or more; the sintered body contains In content more than the surrounding structure, the content of Zn is more than the surrounding structure and the content of the metal M is more than the surrounding tissue, and the content of the above In contains more The average diameter of the circle in which the area of the structure is the smallest, and the average diameter of the circle in which the area including the content of the metal M is the smallest is 25 μm or less. |