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filingDate 2013-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c578c9542166b165169c776a92502609
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publicationDate 2014-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201425541-A
titleOfInvention Method and composition for removing metal hard mask
abstract The present invention provides a method for removing a film from a substrate, the method comprising applying a composition to the film, and wherein the composition comprises at least the following: a) water; and b) at least one selected from the group consisting of a compound of the following compound (iv): i) NR4HF2 (chemical formula 1) wherein R = H, an alkyl group, a substituted alkyl group, ii) NR4F (chemical formula 2) wherein R = H, an alkyl group, a substituted group Alkyl, iii) HF (hydrofluoric acid), iv) H2SiF6 (hexafluoroantimonic acid), or v) combinations thereof. The present invention also provides a composition comprising at least the following: a) water; and b) at least one compound selected from the group consisting of the following compounds (iv): i) NR4HF2 (Formula 1) wherein R = H, alkyl, substituted An alkyl group, ii) NR4F (chemical formula 2), wherein R = H, an alkyl group, a substituted alkyl group, iii) HF (hydrofluoric acid), iv) H2SiF6 (hexafluoroantimonic acid), or v) A combination of the same.
priorityDate 2012-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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