| abstract |
[Question] A composition for forming a base film of a resist for lithography is provided. [Solution] Containing decane, the decane contains at least one of a hydrolyzable organodecane, a hydrolyzate thereof, and a hydrolysis condensate thereof, and the decane has a ring-constituting atom containing a carbon atom and a nitrogen atom and the other atoms. The lithography technique of the heteroatom's cyclic organic decane forms a composition with a resist underlayer film. The hydrolyzable organodecane is of the formula (1): □ (in the formula (1), at least one of R1, R2, and R3 is bonded to the alkyl group by a C 1 to 10 alkyl group and is bonded to -Si (X). a 3-group group, the remaining group being a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 40 carbon atoms, and ring A is a ring-constituting atom containing a carbon atom and at least one nitrogen atom. Further, a cyclic organic group having 5 to 10 membered rings of a sulfur atom or an oxygen atom, and X is a hydrolyzable organic decane represented by an alkoxy group, a decyloxy group or a halogen atom. |