http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201418888-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133345 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-151 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2013-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cdb7c13fc8bdf600afe61158394af77d |
| publicationDate | 2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201418888-A |
| titleOfInvention | Photosensitive resin composition, method for producing cured film using the same, cured film, liquid crystal display device, and organic EL display device |
| abstract | The present invention provides a photosensitive resin composition which maintains high sensitivity and is excellent in chemical resistance. The photosensitive resin composition contains: (A) a polymer component containing a polymer satisfying at least one of the following (1) and (2): (1) including (a1) having an acid group protected by an acid-decomposable group a structural unit of a residue, and (a2) a polymer of a structural unit having a crosslinkable group, and (2) a polymer comprising (a1) a structural unit having a residue in which an acid group is protected by an acid-decomposable group, and A polymer comprising (a2) a structural unit having a crosslinkable group; (B) a photoacid generator; (C) a compound represented by the following formula (c-1); and (D) a solvent. In the formula, ring A represents an aromatic ring having one nitrogen atom, a sulfur atom or an oxygen atom in the ring, X represents a hydrogen atom, an alkyl group or an aryl group, and Y represents a hydroxyl group, a carboxyl group, an alkylcarbonyl group, an arylcarbonyl group, An alkoxycarbonyl group, an alkoxy group, an aryloxy group, a fluorenyl group or an amine group; m represents an integer of 1 or more, and n represents an integer of 1 or more. □ |
| priorityDate | 2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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